Method of expanding process window for the double exposure technique with alt-PSMs

Koji Kikuchi; Hidetoshi Ohnuma; Hiroichi Kawahira

doi:10.1117/12.388947

5 July 2000 Method of expanding process window for the double exposure technique with alt-PSMs

Koji Kikuchi, Hidetoshi Ohnuma, Hiroichi Kawahira

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388947
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

For the fine patterning of gate layers on embedded DRAM is logic devices with a design rule of 0.13 micrometers and below, we have optimized the double exposure technique with an alternative phase shifting mask using KrF excimer laser exposure. Based on the study over lithography process latitude with respect to exposure-defocus window, overlay margin and mask fabrication feasibility, we have adopted a process as that patterns in logic circuits are delineated by the combination of alt-PSM and a trim mask made of Cr shielding patterns on an attenuated phase shifting mask, while patterns in DRAM cells are delineated by the latter att-PSM exposure only. With considering a mask error enhancement factor, optical condition and optical proximity effect correction for the alt-PSM and trim mask are also optimized, then, 0.13 micrometers embedded DRAM in logic patterns have been fabricated with a sufficient common lithography process window by the KrF excimer laser exposure.

Citation Download Citation

Koji Kikuchi, Hidetoshi Ohnuma, and Hiroichi Kawahira "Method of expanding process window for the double exposure technique with alt-PSMs", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388947

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available