High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki; Takanori Nakaike; Osamu Wakabayashi; Hakaru Mizoguchi

doi:10.1117/12.388982

5 July 2000 High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki, Takanori Nakaike, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388982
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The design of high-resolution multi-grating spectrometers for measuring the spectral line width at full width at half maximum and the purity of KrF/ArF excimer lasers is outlined. A special configuration of gratings called DEGA is described in detail. DEGA uses two identical echelle gratings with identical angles of incidence. The focal lengths of the imaging mirrors are 1.8m. The output slit image is magnified five times and detected by a back illumination CCD detector array having a very high DUV sensitivity. The theoretical dispersion of the DEGA spectrometer is 1.2pm/mm. The experimentally measured dispersion of 1.2pm/mm is in good agreement with the theoretical value. The measured resolution is 0.11 pm at the KrF excimer laser wavelength. The long-term stability of DEGA has been evaluated and proven to be sufficiently high to use the spectrometer for high quality KrF/ArF excimer laser production.

Citation Download Citation

Toru Suzuki, Takanori Nakaike, Osamu Wakabayashi, and Hakaru Mizoguchi "High-resolution multigrating spectrometer for high-quality deep-UV light source production", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388982

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