Effect of nonlinear errors on 300-mm wafer overlay performance

Sebastian Schmidt; Alain B. Charles; Dietmar Ganz; Steffen R. Hornig; Guenther Hraschan; John G. Maltabes; Karl E. Mautz; Thomas Metzdorf; Ralf Otto; Jochen Scheurich; Thorsten Schedel; Ralf Schuster

doi:10.1117/12.389080

5 July 2000 Effect of nonlinear errors on 300-mm wafer overlay performance

Sebastian Schmidt, Alain B. Charles, Dietmar Ganz, Steffen R. Hornig, Guenther Hraschan, John G. Maltabes, Karl E. Mautz, Thomas Metzdorf, Ralf Otto, Jochen Scheurich, Thorsten Schedel, Ralf Schuster

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389080
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

SEMICONDUCTOR3000 was the first pilot production facility for 300nm wafers in the world. This company, a joint venture between Infineon Technologies and Motorola, is working to develop a manufacturable 300mm wafer tool set. The lithography tools include I-line stepper, and two DUV scanners. These tools are used to build both 64M DRAM devices and aggressive test vehicles. This paper shows the influence of non-linear errors on 300nm wafers is much stronger than on 200mm wafers. The team determined the root causes for the stronger appearance of these effects and proposed solutions to improve the overlay performance.

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Sebastian Schmidt, Alain B. Charles, Dietmar Ganz, Steffen R. Hornig, Guenther Hraschan, John G. Maltabes, Karl E. Mautz, Thomas Metzdorf, Ralf Otto, Jochen Scheurich, Thorsten Schedel, and Ralf Schuster "Effect of nonlinear errors on 300-mm wafer overlay performance", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389080

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