Application of an effective wavelet matrix transform approach for optical lithography simulation: analysis of topological effects of phase-shifting masks

Seung-Gol Lee; Hyun-Jun Kim; Dong-Hoon Lee; Jong-Ung Lee

doi:10.1117/12.389065

5 July 2000 Application of an effective wavelet matrix transform approach for optical lithography simulation: analysis of topological effects of phase-shifting masks

Seung-Gol Lee, Hyun-Jun Kim, Dong-Hoon Lee, Jong-Ung Lee

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389065
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

In this paper, the boundary element method (BEM) is newly applied to the numerical simulation of an optical lithography, and also is combined with the wavelet matrix transform approach in order to resolve the disadvantage of BEM. Though the impedance matrix derived from the boundary element formulation is usually unsymmetric and fully populated with non-zero elements, the combination of two methods transforms it into the highly sparse matrix, which can be solved efficiently by a sparse solver. The prosed method is implemented for analyzing the topological effect of 2D phase-shifting masks, and their result are compared with those of the waveguide method. From the comparison, it is confirmed that the proposed method would be more efficient than the methods based on either BEM itself or the waveguide method in views of the convergence, the accuracy, the calculation time and the usage of computer memory.

Citation Download Citation

Seung-Gol Lee, Hyun-Jun Kim, Dong-Hoon Lee, and Jong-Ung Lee "Application of an effective wavelet matrix transform approach for optical lithography simulation: analysis of topological effects of phase-shifting masks", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389065

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