Aberrations of steppers using phase-shifting point diffraction interferometry

Parthasarathy Venkataraman; Bruce W. Smith

doi:10.1117/12.388962

5 July 2000 Aberrations of steppers using phase-shifting point diffraction interferometry

Parthasarathy Venkataraman, Bruce W. Smith

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388962
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

There exists no method to study aberrations of stepper system with in-situ interferometry. Such a method would help a lithographer understand a system's limitations. We propose using phase shifting point diffraction interferometry to do this. The paper discusses a prototype experiment done on a 436 nm optic.

Citation Download Citation

Parthasarathy Venkataraman and Bruce W. Smith "Aberrations of steppers using phase-shifting point diffraction interferometry", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388962

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