Paper
23 June 2000 Second-generation 193-nm bottom antireflective coatings (BARCs)
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Abstract
Two organic, spin-on BARCs are in the small scale manufacturing phase -- with the goal being a 193-nm product optimized for commercialization. Chemistries of the BARCs are shown in this paper and performance of the two products relative to industry accepted needs is discussed. The thermoset BARCs, EXP98090B and EXP99001D, are prepared from hydroxy-functional, dye-attached acrylic polymers by adding an aminoplast and sulfonic acid catalyst. With select 193-nm resists, the BARCs give resolution of L/S pairs down to 0.12 micrometer. Plasma etch rates of both BARCs are comparable to those of 193-nm photoresists. Other BARC performance parameters that are discussed for the two products include: film and optical properties, conformality, simulated reflectance curves, spin-bowl compatibility, metals content, and defects.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James D. Meador, Xie Shao, Vandana N. Krishnamurthy, Mikko Arjona, Mandar Bhave, Gu Xu, James B. Claypool, and Anne Lindgren "Second-generation 193-nm bottom antireflective coatings (BARCs)", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388264
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Cited by 1 scholarly publication.
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KEYWORDS
Reflectivity

Etching

Polymers

Plasma etching

Manufacturing

Photoresist materials

Lithography

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