Paper
23 June 2000 Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography
Taro Itatani, Sucheta Gorwadkar, Takafumi Fukushima, Masanori Komuro, Hiroshi Itatani, Masao Tomoi, Tsuenenori Sakamoto, Shunichi Matsumoto
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Abstract
We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 micrometer at a dose of 170 mJ/cm2, and line and space patterns of 0.25 micrometer at a dose of 190 mJ/cm2.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Taro Itatani, Sucheta Gorwadkar, Takafumi Fukushima, Masanori Komuro, Hiroshi Itatani, Masao Tomoi, Tsuenenori Sakamoto, and Shunichi Matsumoto "Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388339
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Cited by 12 scholarly publications.
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KEYWORDS
Lithography

Absorption

Silicon

Scanning electron microscopy

Reflectivity

Dielectrics

Aluminum

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