At-wavelength characterization of DUV-radiation-induced damage in fused silica

Sang Hun Lee; Fan Piao; Patrick P. Naulleau; Kenneth A. Goldberg; William G. Oldham; Jeffrey Bokor

doi:10.1117/12.386529

2 June 2000 At-wavelength characterization of DUV-radiation-induced damage in fused silica

Sang Hun Lee, Fan Piao, Patrick P. Naulleau, Kenneth A. Goldberg, William G. Oldham, Jeffrey Bokor

Author Affiliations +

Proceedings Volume 3998, Metrology, Inspection, and Process Control for Microlithography XIV; (2000) https://doi.org/10.1117/12.386529
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Fused silica is the optical material of choice for deep ultraviolet (DUV) lithographic systems. However, this material is subject to irradiation-induced compaction with ArF excimer radiation. Here we report direct, at-wavelength, wavefront measurements of DUV-laser-damaged fused silica samples performed using phase-shifting point diffraction interferometry (PS/PDI). Experimental results show that the damage anneals in the temperature range of 200 to approximately 600 degrees Celsius. Finally, the interferometric measurements are compared to birefringence studies performed on the same samples.

Citation Download Citation

Sang Hun Lee, Fan Piao, Patrick P. Naulleau, Kenneth A. Goldberg, William G. Oldham, and Jeffrey Bokor "At-wavelength characterization of DUV-radiation-induced damage in fused silica", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); https://doi.org/10.1117/12.386529

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