High-power excimer lasers for high-throughput poly-Si annealing

Michael Fiebig; Rustem Osmanov; Uwe Stamm; Frank Vofl; Peter Oesterlin; Naoyuki Kobayashi; Burkhard Fechner; L. Uzuka

doi:10.1117/12.377054

7 February 2000 High-power excimer lasers for high-throughput poly-Si annealing

Michael Fiebig, Rustem Osmanov, Uwe Stamm, Frank Vofl, Peter Oesterlin, Naoyuki Kobayashi, Burkhard Fechner, L. Uzuka

Proceedings Volume 3888, High-Power Lasers in Manufacturing; (2000) https://doi.org/10.1117/12.377054
Event: Advanced High-Power Lasers and Applications, 1999, Osaka, Japan

Abstract

TFT flat panel displays are rapidly increasing their share in the display market. Polycrystalline-silicon TFT technology is opening the door to highly reliable, high-resolution, high performance and large size Active Matrix Liquid Crystal Displays (AMLCD). For the formation of polycrystalline silicon, excimer laser annealing has shown itself to be superior to all other techniques as far as quality, reliability and economy is concerned. The pronounced non- linearity of the annealing process, the high quality requirements and the high process speeds in the production lines put high demands on the laser beam parameters such as energy stability, beam uniformity and laser output power. In addition, the industrial TFT annealing laser has to be extremely user friendly, reliable, easy to maintain and economical. The remarkable progress in excimer laser technology over the last few years has resulted in a new generation of annealing lasers. Furthermore, in industrial polycrystalline TFT annealing, the beam of the excimer laser has to be modified to achieve high quality and throughput. Consequently, a dedicated Line Beam Optics system has been developed by MICROLAS (Germany). Finally, 'The Japan Steel Works' (JSW, Yokohama, Japan) has developed a highly sophisticated handling system for the production process to form a complete system for optimum shop floor TFT panel fabrication.

Citation Download Citation

Michael Fiebig, Rustem Osmanov, Uwe Stamm, Frank Vofl, Peter Oesterlin, Naoyuki Kobayashi, Burkhard Fechner, and L. Uzuka "High-power excimer lasers for high-throughput poly-Si annealing", Proc. SPIE 3888, High-Power Lasers in Manufacturing, (7 February 2000); https://doi.org/10.1117/12.377054

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