Incorporation of laser proximity correction into mask production

Anja Rosenbusch; James Unruh; Hartmut Kirsch; David Y. Chan

doi:10.1117/12.373347

30 December 1999 Incorporation of laser proximity correction into mask production

Anja Rosenbusch, James Unruh, Hartmut Kirsch, David Y. Chan

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373347
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

The incorporation of laser proximity correction into mask production is presented. The ALTA 3000 has been chosen for demonstration. The goal is to improve pattern fidelity of the ALTA 3000 to a level comparable to the ALTA 3500. This provides the possibility to shift production from the ALTA 3500 to the ALTA 3000 and extends the lifetime of an ALTA 3000. The paper focuses on demonstrating different applications and the incorporation into the standard mask production flow.

Citation Download Citation

Anja Rosenbusch, James Unruh, Hartmut Kirsch, and David Y. Chan "Incorporation of laser proximity correction into mask production", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373347

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