Active vision approach for optimizing illumination in critical surface inspection by machine vision

Tilo Pfeifer; Lorenz Wiegers

doi:10.1117/12.364248

21 September 1999 Active vision approach for optimizing illumination in critical surface inspection by machine vision

Tilo Pfeifer, Lorenz Wiegers

Proceedings Volume 3824, Optical Measurement Systems for Industrial Inspection; (1999) https://doi.org/10.1117/12.364248
Event: Industrial Lasers and Inspection (EUROPTO Series), 1999, Munich, Germany

Abstract

This paper describes a new method for the adaptive control of imaging parameters in automized machine vision systems. By these new methods even in case of critical objects, which show metal and specular reflections or having polished surfaces, the imaging parameters like illumination can be adjusted optimally without any prior knowledge about the surface characteristics. As a result, an image is generated, which is almost free of irrelevant information in the image. This optimized image only contains the 'real' edges actually found on the object's surface and is free of effects resulting from specular reflections or shadows. Surface inspection for scratches, texture analysis or for dimensional measurements becomes much more reliable now.

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Tilo Pfeifer and Lorenz Wiegers "Active vision approach for optimizing illumination in critical surface inspection by machine vision", Proc. SPIE 3824, Optical Measurement Systems for Industrial Inspection, (21 September 1999); https://doi.org/10.1117/12.364248

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KEYWORDS

Inspection

Surface finishing

Machine vision

Reflection

Image filtering

Imaging systems

Metals

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