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15 November 1999 Uniform illumination in SCALPEL by imaging the angular distortion
Daniel Moonen, M. David Nykerk, Pieter Kruit, Warren K. Waskiewicz
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Proceedings Volume 3777, Charged Particle Optics IV; (1999) https://doi.org/10.1117/12.370124
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States
Abstract
An investigation is presented of the possibility to improve electron-beam uniformity of the SCALPEL system by imaging the angular distribution. First, some calculations are carried out which suggest that this angular distribution image should be corrected to enlarge the area of the beam that is uniform within the specifications. Then an optical system is introduced with which this could be done using spherical aberration, and computer simulation results are presented to illustrate the possibilities of such a system.
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Daniel Moonen, M. David Nykerk, Pieter Kruit, and Warren K. Waskiewicz "Uniform illumination in SCALPEL by imaging the angular distortion", Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); https://doi.org/10.1117/12.370124
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KEYWORDS
Monochromatic aberrations
Charged-particle lithography
Charged particle optics
Distortion
Imaging systems
Computer simulations
Tantalum
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