Reactive ion beam etching: a fabrication process for the figuring of precision aspheric optical surfaces in fused silica

Dieter Flamm; Thomas Haensel; Axel Schindler; Andreas Nickel; H.-J. Thomas

doi:10.1117/12.360142

6 September 1999 Reactive ion beam etching: a fabrication process for the figuring of precision aspheric optical surfaces in fused silica

Dieter Flamm, Thomas Haensel, Axel Schindler, Andreas Nickel, H.-J. Thomas

Author Affiliations +

Proceedings Volume 3739, Optical Fabrication and Testing; (1999) https://doi.org/10.1117/12.360142
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

Reactive ion beam etching (RIBE) has been demonstrated to be an efficient figuring process for the fabrication of optical aspheric elements with high asphericities as they are needed for high performance EUV - or x-ray optics and satellite communications optics respectively. Using specially designed broad and medium beam size ion sources a RIBE process based on fluor containing etching gases was developed resulting in high removal rates and very smooth surfaces. In two applications the RIBE figuring was applied for the fabrication of fused silica aspheric surfaces with nanometer accuracy at a figuring depth of some ten micrometers. A setup with a computer controlled two-axis shutter system for shaping of the ion beam was applied for etching of a linear parabolic aspheric surface. In a second application a medium diameter high current source with a fixed beam profile was scanned across the surface with the dwell time being proportional to the desired material removal.

Citation Download Citation

Dieter Flamm, Thomas Haensel, Axel Schindler, Andreas Nickel, and H.-J. Thomas "Reactive ion beam etching: a fabrication process for the figuring of precision aspheric optical surfaces in fused silica", Proc. SPIE 3739, Optical Fabrication and Testing, (6 September 1999); https://doi.org/10.1117/12.360142

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