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Standard approaches of lithographic process simulation have been applied to the simulation of holographically exposed photoresist gratings. Fine tuning of the photoresist development parameters results in a good agreement of simulated and experimentally obtained photoresist profiles. Several conclusions with respect to the optimization of process and photoresist parameters for the fabrication of user defined photoresist profiles are drawn.
Ch. Zanke,Andreas Gombert,Andreas Erdmann, andM. Weiss
"Simulation and optimization of holographically exposed photoresist gratings", Proc. SPIE 3729, Selected Papers from International Conference on Optics and Optoelectronics '98, (29 April 1999); https://doi.org/10.1117/12.346788
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Ch. Zanke, Andreas Gombert, Andreas Erdmann, M. Weiss, "Simulation and optimization of holographically exposed photoresist gratings," Proc. SPIE 3729, Selected Papers from International Conference on Optics and Optoelectronics '98, (29 April 1999); https://doi.org/10.1117/12.346788