Characteristics of sputtered TaX absorbers for x-ray mask

Jeng Tzong Sheu; A. Chu; J. H. Ding; Shyang Su

doi:10.1117/12.351128

25 June 1999 Characteristics of sputtered TaX absorbers for x-ray mask

Jeng Tzong Sheu, A. Chu, J. H. Ding, Shyang Su

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351128
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The materials of x-ray absorbers for x-ray mask have been changed from gold and tungsten-based alloys to tantalum (Ta) and Ta-based compounds in x-ray lithography. Different candidates of x-ray absorber, especially Ta-based compounds, were sputtered and evaluated in this study. By incorporating silicon or germanium into tantalum, amorphous TaSi-based and TaGe-based compounds were formed and qualified as the absorber materials. Because the reproducibility of as- deposited stress by tuning the sputtering parameters is not so well for these compounds right after sputtering, we utilized the step annealing by RTA to control the stress such that within +/- MPa is obtainable. Furthermore, with N₂ plasma treatment in PECVD chamber the slope of stress with respect to annealing temperature is smaller and posses good stability after long-time exposure to the air. Finally, the etching properties of TaX compounds were compared with and without tri-layer structure of oxide/absorber/oxide. And, 0.35 micrometers patterns are etched successfully with vertical sidewall by Cl₂ etchant.

Citation Download Citation

Jeng Tzong Sheu, A. Chu, J. H. Ding, and Shyang Su "Characteristics of sputtered TaX absorbers for x-ray mask", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351128

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