Ion projection lithography for IC manufacturing

Albrecht Ehrmann; Rainer Kaesmaier; Hans Loeschner

doi:10.1117/12.346207

23 April 1999 Ion projection lithography for IC manufacturing

Albrecht Ehrmann, Rainer Kaesmaier, Hans Loeschner

Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346207
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany

Abstract

Since 1997, a MEDEA project funded by European governments has started which aims to proof the feasibility of ion projection lithography for IC production. An ion 4x reduction stepper is built within the project. The system consists of a multicusp ion source producing He ions, electrostatic lens electrodes, the mask unit, an in-situ beam adjustment unit, an off-axis wafer alignment system and a wafer stage. Before the tool is built, results about ion source capabilities and stochastic space charge have to be obtained. In parallel, a stencil mask technology fulfilling the requirements for the use in the ion projection tool is development.

Citation Download Citation

Albrecht Ehrmann, Rainer Kaesmaier, and Hans Loeschner "Ion projection lithography for IC manufacturing", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346207

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