Half-multiphase printing: a proposed throughput improvement on MEBES 4500

Wayne P. Shen

doi:10.1117/12.332855

18 December 1998 Half-multiphase printing: a proposed throughput improvement on MEBES 4500

Wayne P. Shen

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332855
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

This paper proposes a simple writing method, named 'half multiphase printing,' to improve the throughput of the MEBES 4500 raster-scan photomask writer by 40 - 50% while maintaining the same edge accuracy. The concept is simple and easy to apply. It is expected to be a very useful writing mode, especially for those applications with 0.25 - 0.35 micrometer design rules where 0.04 - 0.08 micrometer design grids and PBS resist are still widely used throughout the industry.

Citation Download Citation

Wayne P. Shen "Half-multiphase printing: a proposed throughput improvement on MEBES 4500", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332855

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