Gaps in mask technology with respect to the National Technology Roadmap for Semiconductors

Wallace R. Carpenter; Kimberly Sadler; Thomas White

doi:10.1117/12.332843

18 December 1998 Gaps in mask technology with respect to the National Technology Roadmap for Semiconductors

Wallace R. Carpenter, Kimberly Sadler, Thomas White

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332843
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

There are ever increasing technical and business demands on the mask industry, resulting in increasing costs and cycle times. The support infrastructure continues to lack the ability to provide solutions to mask makers in a timely manner, due to its inability to recover its investment quickly. This further constraints the development resourcing necessary to stay on the Moore's Law Curve. At the same time, the mask industry has not provided a clearly focused set of demands on the equipment suppliers beyond the SIA Roadmap. This paper has taken the approach of collecting key mask metric technology requirements from the entire International SEMATECH mask community as a comparison to the SIA Roadmap requirements through to the 100 nm technology node. The results of that information identify gaps in mask-making technology by metric and process flow, prioritize the key issues, and offer potential solutions to these issues. Mask costs are addressed and challenged.

Citation Download Citation

Wallace R. Carpenter, Kimberly Sadler, and Thomas White "Gaps in mask technology with respect to the National Technology Roadmap for Semiconductors", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332843

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Semiconducting wafers

Semiconductors

Lithography

Manufacturing

Yield improvement

Wafer manufacturing

Show All Keywords

Keywords/Phrases

Search In:

Publication Years