Compact FTIR wafer-state sensors: a new way of in-line ULSI characterization

Victor A. Yakovlev; Sylvie Bosch-Charpenay; Matthew Richter; Peter A. Rosenthal; Peter R. Solomon; Jiazhan Xu

doi:10.1117/12.324422

27 August 1998 Compact FTIR wafer-state sensors: a new way of in-line ULSI characterization

Victor A. Yakovlev, Sylvie Bosch-Charpenay, Matthew Richter, Peter A. Rosenthal, Peter R. Solomon, Jiazhan Xu

Proceedings Volume 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II; (1998) https://doi.org/10.1117/12.324422
Event: Microelectronic Manufacturing, 1998, Santa Clara, CA, United States

Abstract

The perception of FTIR spectroscopy as an expensive, non- compact and vibration sensitive analytical technique, is rapidly changing with the recent introduction of small, robust and fast FTIR spectrometers dedicated to in-line and in-situ process control. FTIR Reflectance Spectroscopy has become a powerful in-line characterization technique delivering information on epi-thickness, doping concentration, dielectric film composition, molecular bond density, thickness of thick semiconductor films, deep trenches, etc., inaccessible in the visible range. The metrology capabilities of the technique will be outlined, including a discussion of process integration and semiconductor yield enchantment issues. The new instrument employs a vibrationally isolated FTIR interferometer and a high-speed digitizer. This combination allows a significantly faster scan rate, and a subsequently superior signal-to-noise ratio. The sensor is designed to be mounted on a process chamber equipped with normal or oblique ports, and provides normal or oblique incidence measuring modes. Outstanding vibration suppression, thermal stability, and high S/N makes it possible to achieve process control with monolayer thickness resolution. Particular examples on ULSI thin film/wafer-state FTIR metrology is presented.

Citation Download Citation

Victor A. Yakovlev, Sylvie Bosch-Charpenay, Matthew Richter, Peter A. Rosenthal, Peter R. Solomon, and Jiazhan Xu "Compact FTIR wafer-state sensors: a new way of in-line ULSI characterization", Proc. SPIE 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II, (27 August 1998); https://doi.org/10.1117/12.324422

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available