New PVK-based photorefractive polymers

Ryszard Burzynski; Saswati Ghosal; Martin K. Casstevens; Deepak N. Kumar; John F. Weibel

doi:10.1117/12.328614

4 December 1998 New PVK-based photorefractive polymers

Ryszard Burzynski, Saswati Ghosal, Martin K. Casstevens, Deepak N. Kumar, John F. Weibel

Proceedings Volume 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications; (1998) https://doi.org/10.1117/12.328614
Event: 1998 International Conference on Applications of Photonic Technology, 1998, Ottawa, Canada

Abstract

This work describes the development, characterization and optimization of materials for optical memory storage applications. The photorefractive polymers are designed to contain second-order nonlinear optical (NLO) chromophores and charge transporting (CT) molecules embedded in a polymer matrix. The necessary electrooptic response is achieved by subjecting samples to a strong dc electric fields in order to induce a non-centrosymmetric arrangement of the NLO chromophores. This paper presents work performed on the design of a new multifunctional NLO-CT polymer.

Citation Download Citation

Ryszard Burzynski, Saswati Ghosal, Martin K. Casstevens, Deepak N. Kumar, and John F. Weibel "New PVK-based photorefractive polymers", Proc. SPIE 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications, (4 December 1998); https://doi.org/10.1117/12.328614

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