Paper
27 October 1998 Comparison of contamination model predictions to LDEF surface measurements
Raymond Rantanen, Tim Gordon, Miria M. Finckenor, Harold Gary Pippin
Author Affiliations +
Abstract
Contaminant deposition measurement have been made on species content and depth profiles on three experiment trays from the long duration exposure facility (LDEF), Auger, Argon sputtering, ESCA and SEM analysis was used to define the contaminant deposits. The Integrated Spacecraft Environments Model (ISEM) was used to predict the deposition levels of the contaminants measured on the three trays. The details of the modeling and the assumptions use dare presented along with the predictions for the deposition on select surfaces on the trays. These are compared to the measured results. The trays represents surfaces that have a high atomic oxygen flux, an intermediate oxygen flux, and no oxygen flux. All surfaces received significant solar UV flux. It appears that the atomic oxygen is necessary for significant deposition to occur. Surfaces that saw significant contaminant flux, solar UV and no atomic oxygen did not show any appreciable levels of observable deposition. The implications of the atomic oxygen interaction with contaminant deposits from silicon contaminant sources is discussed. The primary contaminant sources in the LDEF analysis are DC6-1104 adhesive and Z-306 paint. The result and interpretation of the findings have a potential significant impact on spacecraft surfaces that are exposed to solar UV and atomic oxygen in low Earth orbit.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Raymond Rantanen, Tim Gordon, Miria M. Finckenor, and Harold Gary Pippin "Comparison of contamination model predictions to LDEF surface measurements", Proc. SPIE 3427, Optical Systems Contamination and Degradation, (27 October 1998); https://doi.org/10.1117/12.328498
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Oxygen

Contamination

Silicon

Adaptive optics

Space operations

Ultraviolet radiation

Epitaxial lateral overgrowth

Back to Top