Paper
14 July 1998 Single-pulse high-resolution x-ray contact microscopy with an advanced epoxy novolac resist
Panagiotis Argitis, Alkiviadis Constantinos Cefalas, Z. Kollia, Evangelia Sarantopoulou, Thomas W. Ford, Tony Stead, A. Marranca, Colin N. Danson, J. Knott, David Neely
Author Affiliations +
Proceedings Volume 3423, Second GR-I International Conference on New Laser Technologies and Applications; (1998) https://doi.org/10.1117/12.316626
Event: Second GR-I International Conference on New Laser Technologies and Applications, 1997, Olympia, Greece
Abstract
We report on the use of an epoxy novolac chemically amplified photoresist, to get x-ray images of living biological species in the water window of soft x-rays. This photoresist response was at least two orders of magnitude 'faster' than the standard used PMMA in contact x-ray microscopy. Atomic force microscopy of the resist, relief images obtained with biological specimen masking, suggests a resolution better than 300 nm in lateral dimensions - the size of the cell flagellas - and 20 nm in depth profiles.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Panagiotis Argitis, Alkiviadis Constantinos Cefalas, Z. Kollia, Evangelia Sarantopoulou, Thomas W. Ford, Tony Stead, A. Marranca, Colin N. Danson, J. Knott, and David Neely "Single-pulse high-resolution x-ray contact microscopy with an advanced epoxy novolac resist", Proc. SPIE 3423, Second GR-I International Conference on New Laser Technologies and Applications, (14 July 1998); https://doi.org/10.1117/12.316626
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KEYWORDS
X-rays

Photoresist materials

Epoxies

Polymethylmethacrylate

X-ray microscopy

Laser energy

Pulsed laser operation

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