Use of melting inorganic photoresist for microlens array fabrication

Changtai Yu; Fengzhen Guo; Ying Chen; Hua Yu

doi:10.1117/12.310804

29 June 1998 Use of melting inorganic photoresist for microlens array fabrication

Changtai Yu, Fengzhen Guo, Ying Chen, Hua Yu

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310804
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

In this paper, we will show that it is possible to generate very small lenses by melting islands of inorganic photoresist on a glass substrate. The inorganic photoresist composited by us is suitable to be exposed by Electron Beam (EBE) or X-Ray. We have obtained the lithophotography pattern with 0.6 micrometer line width by EBE exposure. Because the resist pattern will not swell and distort in the developing solution, so there is no problem of shelf-life. We have made lenses with diameter ranging from 0.8 mm to 1.0 mm in the form of spheres and also have studied their optical properties.

Citation Download Citation

Changtai Yu, Fengzhen Guo, Ying Chen, and Hua Yu "Use of melting inorganic photoresist for microlens array fabrication", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310804

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