Performance of an i-line step-and-scan system for sub-0.25-um mix-and-match applications

Peter van Oorschot; Bert Koek; Jeroen van der Spek; Eric Stuiver; Hans Franken; Herman Botter; Reiner B. Garreis

doi:10.1117/12.310771

29 June 1998 Performance of an i-line step-and-scan system for sub-0.25-μm mix-and-match applications

Peter van Oorschot, Bert Koek, Jeroen van der Spek, Eric Stuiver, Hans Franken, Herman Botter, Reiner B. Garreis

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310771
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Step & Scan technology will be used for the next generation of semiconductor lithography tools. This technology has matured over the last year, and results from several DUV tools have been reported. For economical mass production in sub 0.25 micrometer applications, DUV and i-line lithography have to be combined (mix and match). This paper reports on the performance of a new high throughput, high resolution i-line Step & Scan system. The system has a 0.65 NA, 4X projection lens which, together with the AERIAL^TM illuminator, provides a resolution of at least 0.28 micrometer. The identical field sizes and the Step & Scan principle, result in a matched machine overlay, which is comparable to matching only DUV Step & Scan systems.

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Peter van Oorschot, Bert Koek, Jeroen van der Spek, Eric Stuiver, Hans Franken, Herman Botter, and Reiner B. Garreis "Performance of an i-line step-and-scan system for sub-0.25-μm mix-and-match applications", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310771

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