Paper
29 June 1998 Influence of aberration on performance during use of resolution enhancement technology
Kouichirou Tsujita, Junjiro Sakai, Akihiro Nakae, Shuji Nakao, Wataru Wakamiya
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Abstract
We have investigated the influence of a spherical aberration on the printing characteristics with modified illumination. At first, we have developed a simple method for measuring the aberration function with an alternating phase shift mask (PSM), and have measured that in the projection optics of a commercially available KrF stepper. Then the anomalous phenomena observed in the printing with modified illumination are examined with the simulated aerial images with the measured spherical aberration. As a result, we found good coincidence between the simulated images and the anomalies. In conclusion, the origin of the anomalies is ascribed to the spherical aberration in the projection optics.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kouichirou Tsujita, Junjiro Sakai, Akihiro Nakae, Shuji Nakao, and Wataru Wakamiya "Influence of aberration on performance during use of resolution enhancement technology", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310820
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Cited by 3 scholarly publications.
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KEYWORDS
Monochromatic aberrations

Printing

Optical proximity correction

Resolution enhancement technologies

Phase shifts

Imaging systems

Lithographic illumination

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