Chromatic aberration-free TTL alignment system for 193-nm step-and-scan exposure system by using phase conjugate waves

Jin Hyuk Kwon; Yeung Joon Sohn; Hyo Chang Hwang; Dohoon Kim; Hai Bin Chung

doi:10.1117/12.310738

29 June 1998 Chromatic aberration-free TTL alignment system for 193-nm step-and-scan exposure system by using phase conjugate waves

Jin Hyuk Kwon, Yeung Joon Sohn, Hyo Chang Hwang, Dohoon Kim, Hai Bin Chung

Author Affiliations +

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310738
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

A TTL (through-the-lens) alignment system using the holographic phase conjugation in photopolymer films for application to ArF step-and-scan exposure system was designed, and the TTL alignment signals were obtained. The optical setup is similar to the DFWM (degenerate four-wave mixing). The recording materials were HRF 150 photopolymer films of Du Pont corporation, and the recording wavelength was 476 nm of argon ion laser with 400 mW output power. The diffraction efficiencies of photopolymer film were typically around 50%. Fine patterns as small as 1 micron were imaged successfully by the phase conjugate waves generated by DFWM holography. For TTL alignment, the 'X' or chevron patterns of the 1 or 2 micron linewidths were recorded as hologram and the reconstructed phase conjugate beams were used as the align beam through the projection lens which has strong chromatic aberration. TTL alignment signals were obtained by scanning the wafer with alignment mark under the align beam.

Citation Download Citation

Jin Hyuk Kwon, Yeung Joon Sohn, Hyo Chang Hwang, Dohoon Kim, and Hai Bin Chung "Chromatic aberration-free TTL alignment system for 193-nm step-and-scan exposure system by using phase conjugate waves", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310738

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