Paper
5 June 1998 Dynamic characterization of step-induced vibrations of x-ray mask membranes
Michael P. Schlax, Roxann L. Engelstad, Edward G. Lovell
Author Affiliations +
Abstract
Structural damping experiments on x-ray mask membranes have been conducted at the University of Wisconsin and are reported in this paper. For the experiments, the mask format complied with the ARPA-NIST National X-ray Mask Standard. Effective damping parameters have been measured for a 29 mm X 29 mm X 2 micrometers silicon nitride membrane over a pressure range from 1 mtorr to atmospheric. Viscous effects, squeeze film compressibility and added mass effects have al been assessed. Experiments have also been performed on 20 mm and 13 mm square silicon nitride membranes in order to examine the effect of surface area on structural damping. Results from these experiments will provide valuable data on the damping characteristics of mask membranes, ultimately needed in the dynamic transient modeling of mask structural components.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael P. Schlax, Roxann L. Engelstad, and Edward G. Lovell "Dynamic characterization of step-induced vibrations of x-ray mask membranes", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309626
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Cited by 1 scholarly publication.
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KEYWORDS
Photomasks

X-rays

Capacitors

Data modeling

Silicon

Acoustics

X-ray characterization

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