One step closer to the intrinsic laser damage threshold of HfO2 and SiO2 monolayer thin films

Semyon Papernov; D. Zaksas; J. F. Anzellotti; Douglas J. Smith; Ansgar W. Schmid; David R. Collier; Frank A. Carbone

doi:10.1117/12.307018

20 April 1998 One step closer to the intrinsic laser damage threshold of HfO₂ and SiO₂ monolayer thin films

Semyon Papernov, D. Zaksas, J. F. Anzellotti, Douglas J. Smith, Ansgar W. Schmid, David R. Collier, Frank A. Carbone

Proceedings Volume 3244, Laser-Induced Damage in Optical Materials: 1997; (1998) https://doi.org/10.1117/12.307018
Event: Laser-Induced Damage in Optical Materials: 1997, 1997, Boulder, CO, United States

Abstract

Results from monolayer-film laser-damage studies by various authors have remained difficult to compare, owing to many extrinsic factors having impact on measured damage thresholds and observed damage morphology. Prominent among these factors are the deposition method and conditions during deposition, the choice of starting materials, and the condition of supporting substrates. Here special attention is paid to the film-supporting surface with the goal of eliminating interfacial absorption effects. Fused-silica and float-glass substrates are prepared by various techniques: cleaved, conventionally polished, conventionally polished with added magnetorheological finish, and ion milled after conventional polish. Atomic-force microscopy is employed in determining microroughness and mapping laser-damage morphology features after irradiation at 1054 nm and 351 nm. HfO₂ and SiO₂ monolayers deposited on these surfaces showed large variations in damage threshold and morphology, depending on substrate-finish conditions. In spite of highest microroughness, cleaved-float-glass surfaces yielded the highest damage thresholds in both bare and coated forms. A comparison between HfO₂ and SiO₂ monolayer damage thresholds proved SiO₂ to be generally far superior to HfO₂.

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Semyon Papernov, D. Zaksas, J. F. Anzellotti, Douglas J. Smith, Ansgar W. Schmid, David R. Collier, and Frank A. Carbone "One step closer to the intrinsic laser damage threshold of HfO₂ and SiO₂ monolayer thin films", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); https://doi.org/10.1117/12.307018

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