Paper
20 April 1998 Investigation of optical calorimetric absorptance of Suprasil and CaF2 substrates in the UV range
Ute Pfeifer, Bernhard Steiger
Author Affiliations +
Abstract
Calorimetric absorption measurements are a valuable supplement for investigation of laser damage processes at substrate materials in the UV region. Our investigations for the influence of the measurement arrangement and irradiation parameters on the absorption and its wavelength dependence were carried out in the frame of standardization project CHOCLAB. The measurement set-up was presented at the Boulder Damage Symposium last year. To investigate the influence of the spectral dependence of absorptance in the UV range comparison measurements at different excimer laser wavelengths 193 nm, 248 nm and 351 nm were carried out. Suprasil and CaF2 were investigated at different sample thicknesses under variation of irradiation parameters. The measured absorptance of Suprasil at 248 nm and 193 nm increases at growing repetition rates and equal energy density. At a fixed rap rate absorptance is proportional to energy density. Absorptance of CaF2 under irradiation with 193 nm depends on energy density. For both materials the described effects are enhancing with increasing sample thickness.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ute Pfeifer and Bernhard Steiger "Investigation of optical calorimetric absorptance of Suprasil and CaF2 substrates in the UV range", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); https://doi.org/10.1117/12.307012
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KEYWORDS
Ultraviolet radiation

UV optics

Absorption

Excimer lasers

Laser induced damage

Laser processing

Materials processing

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