Novel alternating phase-shift mask with improved phase accuracy

Naoyuki Ishiwata; Takema Kobayashi; Satoru Asai; Isamu Hanyu

doi:10.1117/12.301196

12 February 1997 Novel alternating phase-shift mask with improved phase accuracy

Naoyuki Ishiwata, Takema Kobayashi, Satoru Asai, Isamu Hanyu

Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301196
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States

Abstract

We developed an alternating phase shift mask that offers a sufficient phase accuracy for manufacturing sub-0.18 micrometer devices with 248 nm deep-UV lithography. This mask has a Cr/spin-on-glass/quartz structure. Our mask fabrication process utilizes some new techniques which include the use of a SOG shifter with extra thickness, a two step SOG etching, and an additional wet etchign process for phase adjustment. Our process showed a good performance, and a phase controllability of 180 plus or minus 0.7 degrees was achieved. Phase uniformity was less than 3 degrees over a 100 mm square area. It was nearly equal to the uniformity of the SOG thickness. These results prove that the additional etching process is very effective at improving phase accuracy.

Citation Download Citation

Naoyuki Ishiwata, Takema Kobayashi, Satoru Asai, and Isamu Hanyu "Novel alternating phase-shift mask with improved phase accuracy", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301196

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