Manufacture of photomasks for critical layers of sub-half-micron CMOS technology

Brian Martin; Tim R. Waring

doi:10.1117/12.301201

12 February 1997 Manufacture of photomasks for critical layers of sub-half-micron CMOS technology

Brian Martin, Tim R. Waring

Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301201
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States

Abstract

Results are presented of dimensional measurements on 6 inch photomasks manufactured for the critical layers of a sub-half- micron CMOS process. Measurements show that dimensional control is excellent across individual plates but that capability indices are impaired by drift of mean-mean between individual photomasks. The measurement tool used was shown to be incapable of supporting the advanced manufacturing specification but its performance was improved by taking multi-point measurements.

Citation Download Citation

Brian Martin and Tim R. Waring "Manufacture of photomasks for critical layers of sub-half-micron CMOS technology", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301201

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