Paper
18 August 1997 Cleaning force in laser cleaning of silicon substrates
Wen Dong Song, Yongfeng Lu, Kaidong D. Ye, C. K. Tee, Minghui Hong, Daming Liu, Tohsiew Low
Author Affiliations +
Proceedings Volume 3184, Microelectronic Packaging and Laser Processing; (1997) https://doi.org/10.1117/12.280569
Event: ISMA '97 International Symposium on Microelectronics and Assembly, 1997, Singapore, Singapore
Abstract
A laser cleaning model was established for removal of non- absorbing particles from an absorbing solid surface by taking adhesion force and cleaning force into account. The cleaning force per unit area due to laser-induced thermal expansion of a substrate surface is (gamma) E (Delta) T(0, t), where (gamma) , E, and (Delta) T(0, t) are the linear thermal expansion coefficient, the elastic modulus and temperature rise at the substrate surface, respectively. The cleaning condition and threshold fluence can be obtained by comparing the cleaning force and the adhesion force. The theoretical analysis shows that cleaning force increases with increasing laser fluence, deducing the pulse duration, or decreasing laser wavelength, which leads to a higher cleaning efficiency at higher laser fluence, smaller pulse duration or shorter laser wavelength. The experimental results show that the cleaning threshold fluence for laser removal of quartz particles from silicon surfaces is about 135 mJ/cm2, which is in good consistency with the theoretical threshold fluence of 120 mJ/cm2. With increasing laser fluence, the cleaning efficiency increases, which has been predicted by our theoretical analysis.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wen Dong Song, Yongfeng Lu, Kaidong D. Ye, C. K. Tee, Minghui Hong, Daming Liu, and Tohsiew Low "Cleaning force in laser cleaning of silicon substrates", Proc. SPIE 3184, Microelectronic Packaging and Laser Processing, (18 August 1997); https://doi.org/10.1117/12.280569
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Pulsed laser operation

Semiconductor lasers

Silicon

Laser damage threshold

Particles

Quartz

Solids

RELATED CONTENT

Laser surface cleaning of electronic materials
Proceedings of SPIE (July 15 1999)
Study of laser die release by Q switched Nd YAG...
Proceedings of SPIE (September 20 2004)
Threshold measurements in laser-assisted particle removal
Proceedings of SPIE (December 01 1991)
Laser cleaning of silicon membrane stencil masks
Proceedings of SPIE (February 03 2000)

Back to Top