Cleaning technology of PSM for sub-quarter-micron devices

Hitoshi Handa; Masumi Takahashi; Yutaka Miyahara

doi:10.1117/12.277298

28 July 1997 Cleaning technology of PSM for sub-quarter-micron devices

Hitoshi Handa, Masumi Takahashi, Yutaka Miyahara

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277298
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

Cleaning of PSM is one of the most important technology for the development and production of quarter micron devices. In cleaning of PSM, it is needed not only to remove the particles on shifter and quartz, but also not to change the phase angle and the transmittance. For this purpose, new technology of PSM cleaning has been developed. Through the cleaning of 'MoSiON- halftone,' effectiveness of our techniques is shown.

Citation Download Citation

Hitoshi Handa, Masumi Takahashi, and Yutaka Miyahara "Cleaning technology of PSM for sub-quarter-micron devices", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277298

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