Paper
28 July 1997 ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks
Yuko Seki, Jun Ushioda, Takashi Saito, Katsumi Maeda, Kaichiro Nakano, Shigeyuki Iwasa, Takeshi Ohfuji, Hiroshi Tanabe
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Abstract
The exposure durability of chromium fluoride (CrF) was evaluated for phase shifter material in ArF excimer laser lithography. The film quality changes after 193 nm light irradiation were measured by using an optical spectroscope, an x-ray photoelectron spectroscopy (XPS), and an atomic force microscope (AFM). The film quality changes, such as decline of transmittance, surface oxidation, and roughness, were occurred in the sample irradiated in air, while little change were observed in nitrogen atmosphere.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuko Seki, Jun Ushioda, Takashi Saito, Katsumi Maeda, Kaichiro Nakano, Shigeyuki Iwasa, Takeshi Ohfuji, and Hiroshi Tanabe "ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277260
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Cited by 1 scholarly publication.
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KEYWORDS
Photomasks

Excimer lasers

Nitrogen

Transmittance

Phase shifts

Lithography

Glasses

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