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7 July 1997 Submicron DUV lithography using second-harmonic light of copper vapor laser
Huijie Huang, Dunwu Lu, Hongwu Ren, Peihui Liang, Longlong Du
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Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276054
Event: Microlithography '97, 1997, Santa Clara, CA, United States
Abstract
In order to study the feasibility of submicron lithography using second-harmonic light (SHL) at wavelength of 255.3 nm of copper vapor laser (CVL), a 1:1 catadioptric projection lens and an illumination system are designed and constructed. A resolution of 0.7 micrometers line/space patterns is produced in AZ1350J resist, which reveals that the SHL of CVL can be used as an illumination source in submicron lithography.
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Huijie Huang, Dunwu Lu, Hongwu Ren, Peihui Liang, and Longlong Du "Submicron DUV lithography using second-harmonic light of copper vapor laser", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276054
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KEYWORDS
Submicron lithography
Copper vapor lasers
Deep ultraviolet
Lithography
Lithographic illumination
Combined lens-mirror systems
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