Measurement of trace acid levels in diazonaphthoquinone photoactive compounds (PACs)

Joseph E. Oberlander; Stan F. Wanat; Eleazar Gonzalez; Douglas S. McKenzie

doi:10.1117/12.275855

7 July 1997 Measurement of trace acid levels in diazonaphthoquinone photoactive compounds (PACs)

Joseph E. Oberlander, Stan F. Wanat, Eleazar Gonzalez, Douglas S. McKenzie

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275855
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

With the continuing drive to control and improve resist performance, the need to monitor and control all aspects of the resist has become more important. The presence of acids in the resist can have a significant impact on the performance. Monitoring acid levels in diazonaphthoquinone PACs is an area that has not had much attention to date. A procedure has been developed to measure acid levels in these compounds. The procedure uses Congo red dye as an acid indicator in aqueous THF and monitors changes spectrophotometrically. The method is capable of measuring acidity of resist components in the 10 to 100 ppm range. This procedure has been applied to the forced aging of dry diazonaphthoquinone PACs. The results show that the 2,1,5 isomer decomposes faster than the 2,1,4, isomer. The method is sufficiently general that it can be used to monitor acid level in other resist components or in resist solutions (see also accompanying paper #3049-50).

Citation Download Citation

Joseph E. Oberlander, Stan F. Wanat, Eleazar Gonzalez, and Douglas S. McKenzie "Measurement of trace acid levels in diazonaphthoquinone photoactive compounds (PACs)", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275855

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