Three-dimensional electron-beam lithography simulation

Chris A. Mack

doi:10.1117/12.275807

7 July 1997 Three-dimensional electron-beam lithography simulation

Chris A. Mack

Proceedings Volume 3048, Emerging Lithographic Technologies; (1997) https://doi.org/10.1117/12.275807
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography. Monte Carlo simulations are combined with a beam shape to generate a single 'pixel' energy distribution. This pixel is then used to write a pattern by controlling the dose of every pixel on an address grid. The resulting dose pattern is used to expose and develop a resist to form a three-dimensional resist pattern.

Citation Download Citation

Chris A. Mack "Three-dimensional electron-beam lithography simulation", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); https://doi.org/10.1117/12.275807

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