Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry

Kenneth A. Goldberg; Edita Tejnil; Sang Hun Lee; Hector Medecki; David T. Attwood Jr.; Keith H. Jackson; Jeffrey Bokor

doi:10.1117/12.275787

7 July 1997 Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry

Kenneth A. Goldberg, Edita Tejnil, Sang Hun Lee, Hector Medecki, David T. Attwood Jr., Keith H. Jackson, Jeffrey Bokor

Proceedings Volume 3048, Emerging Lithographic Technologies; (1997) https://doi.org/10.1117/12.275787
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

We report wavefront measurement of a multilayer-coated, reflective optical system at 13.4-nm wavelength performed using a novel phase-shifting point-diffraction interferometer. Successful interferometric measurements of a 10x Schwarzschild objective designed for extreme ultraviolet projection lithography with 0.1-micrometer resolution demonstrate high- precision with sub-nanometer resolution. The goal of the interferometry is to achieve wavefront measurement accuracy beyond lambda/50 rms at EUV wavelengths. Preliminary measurements are discussed and the paths toward achieving the target accuracy are identified.

Citation Download Citation

Kenneth A. Goldberg, Edita Tejnil, Sang Hun Lee, Hector Medecki, David T. Attwood Jr., Keith H. Jackson, and Jeffrey Bokor "Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); https://doi.org/10.1117/12.275787

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