Active noise cancellation technique for highly accurate EB lithography systems

Koji Nagata; Masahide Okumura; Norio Saitou; Hiroyoshi Ando; Toshiyuki Morimura; Ken Iizumi; Teruo Iwasaki

doi:10.1117/12.275778

7 July 1997 Active noise cancellation technique for highly accurate EB lithography systems

Koji Nagata, Masahide Okumura, Norio Saitou, Hiroyoshi Ando, Toshiyuki Morimura, Ken Iizumi, Teruo Iwasaki

Proceedings Volume 3048, Emerging Lithographic Technologies; (1997) https://doi.org/10.1117/12.275778
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

We propose a compensation method, which we call the active noise cancelation technique, to improve the pattern positioning accuracy in electron-beam (EB) lithography. This compensation method corrects pattern positioning error by eliminating EB vibration at the power-supply (PS) frequency (50 or 60 Hz), which is one of the main causes of the error. In this compensation method, a compensatory signal is generated by extracting one period from the EB vibration, which is measured before exposure. During exposure, this signal is added to the deflection-control signal. Because the EB is constantly deflected in the direction opposite to the EB vibration, the pattern positioning error due to EB vibration can be corrected. To evaluate the improvement of the accuracy of an EB lithography system with this compensation method, we applied it to our EB lithography system (HL-800 series). We found that the EB vibration at the PS frequency, whose amplitude was about 0.03 micrometer without the use of this compensation method could be reduced to less than 0.01 micrometer with the compensation. We also evaluated the stitching accuracy between stripes of continues stage moving. Without compensation, the accuracy (mean plus 3 sigma) was improved from 0.064 micrometer in the X direction and 0.044 micrometer in the Y direction to 0.027 and 0.014 micrometer respectively by using this compensation. Therefore, we confirmed that this compensation method was effective to improve the accuracy of EB lithography systems.

Citation Download Citation

Koji Nagata, Masahide Okumura, Norio Saitou, Hiroyoshi Ando, Toshiyuki Morimura, Ken Iizumi, and Teruo Iwasaki "Active noise cancellation technique for highly accurate EB lithography systems", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); https://doi.org/10.1117/12.275778

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KEYWORDS

Lithography

Picosecond phenomena

Magnetism

Photomasks

Critical dimension metrology

Signal generators

Analytical research

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