Pure aluminum process solution for advanced LCDs

Rajiv G. Pethe; Milind Bedekar; Richard E. Demaray; Chandra V. Deshpandey; Henry Shao

doi:10.1117/12.270287

10 April 1997 Pure aluminum process solution for advanced LCDs

Rajiv G. Pethe, Milind Bedekar, Richard E. Demaray, Chandra V. Deshpandey, Henry Shao

Proceedings Volume 3014, Active Matrix Liquid Crystal Displays Technology and Applications; (1997) https://doi.org/10.1117/12.270287
Event: Electronic Imaging '97, 1997, San Jose, CA, United States

Abstract

Large size high-resolution liquid crystal displays put severe restriction on metal selection for gate lines where very low resistivity is required. Pure aluminum (Al) could be used of hillocking issues could be resolved. In this paper we demonstrated an Al deposition process on glass substrates with ultra low hillock density after photoresist and dielectric processing. Effects of process parameters such as substrate temperature, substrate roughness, base pressure and underlayer thickness on morphology and texture of aluminum are discussed.

Citation Download Citation

Rajiv G. Pethe, Milind Bedekar, Richard E. Demaray, Chandra V. Deshpandey, and Henry Shao "Pure aluminum process solution for advanced LCDs", Proc. SPIE 3014, Active Matrix Liquid Crystal Displays Technology and Applications, (10 April 1997); https://doi.org/10.1117/12.270287

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