WDM laser arrays with 2-nm channel spacing fabricated using a grating phase mask

David Robert McDonald; Jin Hong; Frank R. Shepherd; Carla J. Miner; M. Cleroux; S. Ojha; R. Baulcomb; C. Rogers; S. J. Clements

doi:10.1117/12.273819

1 May 1997 WDM laser arrays with 2-nm channel spacing fabricated using a grating phase mask

David Robert McDonald, Jin Hong, Frank R. Shepherd, Carla J. Miner, M. Cleroux, S. Ojha, R. Baulcomb, C. Rogers, S. J. Clements

Author Affiliations +

Proceedings Volume 3004, Fabrication, Testing, and Reliability of Semiconductor Lasers II; (1997) https://doi.org/10.1117/12.273819
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

High density wavelength division multiplexing (DWDM) requires several channels with a fixed wavelength spacing of 1 - 2 nm. This can be achieved by fabricating arrays of distributed feedback (DFB) lasers, using a photomask method to print the gratings with a different period for each DFB laser in the array. The grating phase mask is fabricated first, using e-beam lithography and reactive ion etching. The parallel exposure of all gratings using such a mask is orders of magnitude faster than direct wafer writing, using e-beam lithography. The characteristics of 8-channel gain coupled DFB laser arrays designed for a 2 nm channel spacing are reported. The required performance, achievable yield (i.e. cost), packaging requirements and reliability will determine whether these arrays are suitable for use in DWDM systems.

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David Robert McDonald, Jin Hong, Frank R. Shepherd, Carla J. Miner, M. Cleroux, S. Ojha, R. Baulcomb, C. Rogers, and S. J. Clements "WDM laser arrays with 2-nm channel spacing fabricated using a grating phase mask", Proc. SPIE 3004, Fabrication, Testing, and Reliability of Semiconductor Lasers II, (1 May 1997); https://doi.org/10.1117/12.273819

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