Use of silicon Vee groove technology in the design and volume manufacture of optical devices

Robert Cann; Paul Harrison; David A.H. Spear

doi:10.1117/12.273831

1 May 1997 Use of silicon Vee groove technology in the design and volume manufacture of optical devices

Robert Cann, Paul Harrison, David A.H. Spear

Proceedings Volume 3004, Fabrication, Testing, and Reliability of Semiconductor Lasers II; (1997) https://doi.org/10.1117/12.273831
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

The use of optical devices in telecommunications in the access arena requires cost and size reduction, product simplification and high stability. These have been achieved by the use of a silicon optical bench. The technology allows passive alignment to the laser diode by locating the fiber in a Vee groove precision etched in a silicon substrate. An additional advantage of this technology is the inherent robustness of the coupling of the fiber to the laser diode emission which has enabled both high reliability and stability to be achieved. This paper presents the main features of the technology, including the controls required during manufacture, and the resulting high stability of the device over extremes of environmental conditions.

Citation Download Citation

Robert Cann, Paul Harrison, and David A.H. Spear "Use of silicon Vee groove technology in the design and volume manufacture of optical devices", Proc. SPIE 3004, Fabrication, Testing, and Reliability of Semiconductor Lasers II, (1 May 1997); https://doi.org/10.1117/12.273831

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