Photolithography challenges for the micromachining industry

David Craven

doi:10.1117/12.262838

27 December 1996 Photolithography challenges for the micromachining industry

David Craven

Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262838
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

Micromachining can be considered a fabrication technology for building devices with feature sizes from a few microns to a few mils, often with moving parts. MicroeElectroMechemical Systems (MEMS) is a term often used interchangeably with micromachining. MEMS devices, however, are distinguished from micromachining by their mechanical nature, because moving parts are often a required component to enable them to sense or manipulate the external environment.

Citation Download Citation

David Craven "Photolithography challenges for the micromachining industry", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262838

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