Contamination removal from photomasks using a dry laser-assisted cleaning technology

Audrey C. Engelsberg

doi:10.1117/12.262798

27 December 1996 Contamination removal from photomasks using a dry laser-assisted cleaning technology

Audrey C. Engelsberg

Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262798
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

Photomask manufacturing for sub-0.5 micron ICs faces two principal challenges: efficient cleaning within cycle time requirements and minimization of water and chemical usage. A new technology using only deep ultraviolet photons and a flowing inert gas cleans state-of-the-art optical and x-ray photomasks. The technology uses no water or chemicals. Tools can handle single or multiple substrate sizes. There is no optical reflectivity change in the chrome. No damage is observed on chrome patterns from either backside or front side exposure whether the features are positioned horizontally or vertically. Our work to date indicates that this technology meets the cycle time requirements in the photomask manufacturing process.

Citation Download Citation

Audrey C. Engelsberg "Contamination removal from photomasks using a dry laser-assisted cleaning technology", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262798

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