Paper
13 September 1996 Multilevel 3D patterning of stacked PMMA sheets for x-ray microlithography
Gina M. Calderon, Kevin J. Morris, Olga Vladimirsky, Yuli Vladimirsky
Author Affiliations +
Proceedings Volume 2880, Microlithography and Metrology in Micromachining II; (1996) https://doi.org/10.1117/12.250955
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States
Abstract
This paper presents a novel technique for fabricating 3D patterns in a thick layered resist and describes an alignment aide designed for the specific application of thick resist x-ray micromachining. In this technique, a PMMA layer of desired thickness is formed on a substrate by spinning or solvent bonding. The layer is exposed with X- rays to generate a latent image. A second layer of PMMA is bonded over the first layer and is exposed with an appropriate mask, generating a latent image in the second layer. This process can be repeated several times creating a 3D latent image. Simultaneous development forms a true 3D pattern in the PMMA resist.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gina M. Calderon, Kevin J. Morris, Olga Vladimirsky, and Yuli Vladimirsky "Multilevel 3D patterning of stacked PMMA sheets for x-ray microlithography", Proc. SPIE 2880, Microlithography and Metrology in Micromachining II, (13 September 1996); https://doi.org/10.1117/12.250955
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CITATIONS
Cited by 7 scholarly publications and 4 patents.
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KEYWORDS
Polymethylmethacrylate

Photomasks

X-rays

3D image processing

Optical lithography

Optical alignment

3D microstructuring

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