Contamination Simulation Facility With In Situ Infrared Analysis Capability

David J. Carre; Paul D. Fleischauer

doi:10.1117/12.932014

19 February 1982 Contamination Simulation Facility With In Situ Infrared Analysis Capability

David J. Carre, Paul D. Fleischauer

Proceedings Volume 0287, Shuttle Optical Environment; (1982) https://doi.org/10.1117/12.932014
Event: 1981 Technical Symposium East, 1981, Washington, D.C., United States

Abstract

A new volatile condensable materials (VCM) facility has been constructed. The facility features a unique in situ Fourier transform infrared spectrophotometric system in addition to a quartz crystal microbalance and quadrupole mass spectrometer. Contaminants can be collected and subjected to infrared spectroscopy at the collection temperature, circumventing problems associated with ex situ infrared measurements. Preliminary results indicate that VCM, with deposition thicknesses less than 200 Å, can be identified.

Citation Download Citation

David J. Carre and Paul D. Fleischauer "Contamination Simulation Facility With In Situ Infrared Analysis Capability", Proc. SPIE 0287, Shuttle Optical Environment, (19 February 1982); https://doi.org/10.1117/12.932014

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available