Making a photoresist relief hologram with expection groove depth

Liyun Zhong; Wenbi Zhang; Bingheng Xiong; Qiming Yang; Aibing Gong

doi:10.1117/12.263101

31 December 1996 Making a photoresist relief hologram with expection groove depth

Liyun Zhong, Wenbi Zhang, Bingheng Xiong, Qiming Yang, Aibing Gong

Proceedings Volume 2866, International Conference on Holography and Optical Information Processing (ICHOIP '96); (1996) https://doi.org/10.1117/12.263101
Event: International Conference on Holography and Optical Information Processing, 1996, Nanjing, China

Abstract

The holographic information transferred from photoresist master to replica is the relief groove depth. Many properties of the replica are related to groove depth of master, so to control the groove depth of photoresist master is important. In this paper, a novel method is adopted to obtain the value of the phase modulation by measuring diffraction light intensity of the photoresist master, since there is a certain relationship between groove depth and phase modulation, so the groove depth can be obtained indirectly.

Citation Download Citation

Liyun Zhong, Wenbi Zhang, Bingheng Xiong, Qiming Yang, and Aibing Gong "Making a photoresist relief hologram with expection groove depth", Proc. SPIE 2866, International Conference on Holography and Optical Information Processing (ICHOIP '96), (31 December 1996); https://doi.org/10.1117/12.263101

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