Paper
24 July 1996 New figure-fracturing algorithm for high-quality variable-shaped e-beam exposure data generation
Hiroomi Nakao, Koichi Moriizumi, Kinya Kamiyama, Masayuki Terai, Hisaharu Miwa
Author Affiliations +
Abstract
We present a new figure fracturing algorithm that partitions each polygon in layout design data into trapezoids for vriab1eshaped EB exposure data generation. In order to improve the dimension accuracy of fabricated mask patterns created using the figure fracturing result, our algorithm has two new effective functions, one for suppressing narrow figure generation and the other for suppressing critical part partition. Furthermore, using a new graph based approach, our algorithm efficiently chooses from all the possible partitioning lines an appropriate set of lines by which optimal figure fracturing is performed. The application results show that the algorithm produces high quality results in a reasonable processing time.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroomi Nakao, Koichi Moriizumi, Kinya Kamiyama, Masayuki Terai, and Hisaharu Miwa "New figure-fracturing algorithm for high-quality variable-shaped e-beam exposure data generation", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245230
Lens.org Logo
CITATIONS
Cited by 5 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Solids

Charge-coupled devices

Photomasks

Silicon

Beam shaping

Critical dimension metrology

Electron beams

RELATED CONTENT


Back to Top