Evaluation of light resistance of pellicle membrane in the environment with solvent

Toru Shirasaki; Meguru Kashida; Yoshihiro Kubota

doi:10.1117/12.245232

24 July 1996 Evaluation of light resistance of pellicle membrane in the environment with solvent

Toru Shirasaki, Meguru Kashida, Yoshihiro Kubota

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245232
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

The effect of solvent existence in the photolithographic environment on pellicle is studied. Solvent induces photoreaction and affects pellicles when absorptive solvent at exposure light wavelength exists in the photolithographic environment. The photoreaction depends greatly on exposure intensity. Oxide deposition is dominant at weaker intensity and that has a worse influence on pellicles than thickness reduction at strong intensity. It is necessary to keep the concentration of solvent in the photolithographic environment at low level to prevent the photoreaction of solvent.

Citation Download Citation

Toru Shirasaki, Meguru Kashida, and Yoshihiro Kubota "Evaluation of light resistance of pellicle membrane in the environment with solvent", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245232

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