Paper
8 April 1996 UV FEL light source for industrial processing
Michael J. Kelley, H. Frederick Dylla, George R. Neil, Leonard J. Brillson, Daniel P. Henkel, Henry Helvajian
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Abstract
Short-wavelength UV light is strongly absorbed by most materials, creating the opportunity to drive near-surface thermal or chemical processes. The resulting modifications have a wide range of prospective applications, but few have been developed because of the low capacity and high unit cost of light from present sources. We analyze the light source requirements for large-scale applications to polymers and metals. We describe meeting them with free electron laser whose design is described in a companion paper in this session. This machine will deliver 1.0 to 2.5 kW between 190 nm and 350 nm with options in the visible and IR, and serve to further develop FEL technology for much higher powered machines. We gratefully acknowledge support for this work from the Commonwealth of Virginia Center for Innovative Technologies and The U.S. Department of Energy.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael J. Kelley, H. Frederick Dylla, George R. Neil, Leonard J. Brillson, Daniel P. Henkel, and Henry Helvajian "UV FEL light source for industrial processing", Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); https://doi.org/10.1117/12.237725
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CITATIONS
Cited by 8 scholarly publications.
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KEYWORDS
Polymers

Light sources

Ultraviolet radiation

Free electron lasers

Metals

Excimer lasers

Manufacturing

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